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PostDoc position in Atomic Layer Deposition (ALD) of Multilayer Materials 100%
The Low Dimensional Materials Group of our Laboratory for Mechanics of Materials and Nanostructures is offering a
Multilayer materials enable tailoring of mechanical, electrical, and optical film properties in a wide range. We want to exploit the potential of ALD as well as post-growth treatments to tailor such properties and to investigate the multilayers with respect to nucleation issues, residual film stress, adhesion, yield stress, and chemical resistance, to name a few. Modelling and simulations will be used to establish materials design guidelines realized by the ALD processes.
You will successfully lead projects due to your excellent skills in solution-driven scientific and technological work. You have a Doctoral Degree preferably in Chemistry, Physics, or Materials Sciences from an internationally recognized institution. Hands-on background in metalorganic chemistry, vacuum science, thin film deposition and characterisation are highly desired. Modelling background with standard math & physics software (like Matlab and COMSOL or similar) is also required.
You are a highly motivated person with the ability to think creatively, to progress work autonomously and to filter essential scientific content from experiments. Furthermore, you are a team player, mobile to keep contact with project partners and you have excellent communication skills. Proficiency in spoken and written English is mandatory.
This position is available as from January 1st, 2017 or upon agreement for a period of 1 year with the possibility of extension up to three years.
We are looking forward to your application including a letter of motivation, CV, and transcripts of diplomas, BSc, MSc, and doctoral levels, list of publications and a list of at least three references. For additional information please contact Dr. Ivo Utke, Ivo.Utke@empa.ch.